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SPIE Photomask 2007
Date: September 17 - 21 , 2007
Location: Monterey Marriott & Monterey Conference Center,
Monterey, California
Booth: 314 |
DISKCON USA Tradeshow and Conference
Date: September 19 - 20, 2007
Location: Hyatt Regency Hotel & Santa Clara Convention Center.
Santa Clara, California
Booth: 204 |
SPIE Advanced Lithography
Date: February 26 - 27, 2008
Location: San Jose Convention Center, San Jose, California
Booth: 626 |
Semicon West
Date: July 15 - 17, 2008
Location: Moscone Center, San Francisco, California
Booth: 345 |
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SPIE Photomask 2007
Date: September 18, 2007
Location: Monterey Marriott and Monterey Conference Center,
Monterey, California
Title: "Signature Evaluation Using OCD Metrology " (Poster paper) |
DISKCON 2007
Date: September 19, 2007
Location: Santa Clara Convention Center, Santa Clara, California, USA
Title: "Characterization of Perpendicular Magnetic Recording Media using Broadband Optical Reflectometry" (Poster paper) |
SPIE Photomask 2007- Session 23: Metrology II
Date: September 20, 2007
Location: Monterey Marriott and Monterey Conference Center,
Monterey, California
Title: "Measurements of Corner Rounding
in 2-D Contact Holes on Phase Shift Masks"
Speaker: Alex Gray, n&k Technology |
The 24th European Mask and Lithography Conference - EMLC 2008
Date: January 21 - 24, 2008
Location: Hilton Hotel, Dresden, Germany
Title: "Measuring Contact Hole Corner Rounding Uniformity Using Optical OCD Metrology "
Speaker: John Lam, n&k Technology
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To contact public relations:
e-mail: inforequest@nandk.com
phone: 408-513-3800
fax: 408-513-3850
standard mail:
n&k Technology, Inc.
80 Las Colinas Lane
San Jose, CA 95119
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