n&k Technology, Inc., of San Jose, California, manufactures advanced metrology tools for semiconductor, photomask, solar cell, flat panel display, and data storage industries. The company's high resolution optical metrology systems are used for film thickness, n and k, phase shift, trench depth, CD and profile measurements. The core technology is based on DUV-Vis-NIR broadband spectrophotometry with patented reflective optics, in conjunction with the Forouhi-Bloomer dispersion equations and Rigorous Coupled Wave Analysis. n&k Technology systems, ranging from table-top to fully automated, are field-proven, production-worthy, fast, accurate, and non-destructive, and will enable users to characterize virtually any combination of thin films, substrates, and structures.